A novel and very simple ellipsometer for the characterization of film-substrate systems that employs one rotating optical element (a polarizer) is proposed. The ellipsometer is based on detecting the angles of incidence at which a film-substrate system has equal amplitude attenuations for light polarized parallel (p) and perpendicular (s) to the plane of incidence. At a certain wavelength, the film thickness of the filmsubstrate system has to lie within permissible-thickness bands (PTB) for the technique to apply.
Journal of the Optical Society of America (1917-1983)
A.-R. M. Zaghloul and R. M. A. Azzam, "Single-element rotating-polarizer ellipsometer for film-substrate systems," J. Opt. Soc. Am. 67, 1286-1287 (1977)