Date of Award
5-2009
Degree Type
Thesis
Degree Name
M.S.
Degree Program
Applied Physics
Department
Physics
Major Professor
Zhou, Weilie; Stokes, Kevin
Second Advisor
Malkinski, Leszek
Third Advisor
Spinu, Leonard
Abstract
In this thesis, we demonstrate in-situ scanning electron microscopy techniques for both electron beam lithography (EBL) and in-situ one dimensional nano materials electrical characterization. A precise voltage contrast image positioning for in-situ EBL to integrate nanowires into suspended structures for nanoswitch fabrication has been developed. The in-situ EBL eliminates the stage movement error and field stitching error by preventing any movements of the stage during the nanolithography process; hence, a high precision laser stage and alignment marks on the substrate are not needed, which simplifies the traditional EBL process. The ZnO piezoelectronics is also studied using nano-manipulators in scanning electron microscope. Methods to improve the contact have been demonstrated and the contacts between probe tips and the nanowires are found to have significant impact on the measurement results.
Recommended Citation
Long, Renhai, "In-situ Scanning Electron Microscopy for Electron-beam Lithography and In-situ One Dimensional Nano Materials Characterization" (2009). University of New Orleans Theses and Dissertations. 966.
https://scholarworks.uno.edu/td/966
Rights
The University of New Orleans and its agents retain the non-exclusive license to archive and make accessible this dissertation or thesis in whole or in part in all forms of media, now or hereafter known. The author retains all other ownership rights to the copyright of the thesis or dissertation.