Date of Award

5-15-2009

Degree Type

Thesis

Degree Name

M.S.

Degree Program

Applied Physics

Department

Physics

Major Professor

Zhou, Weilie; Stokes, Kevin

Second Advisor

Malkinski, Leszek

Third Advisor

Spinu, Leonard

Abstract

In this thesis, we demonstrate in-situ scanning electron microscopy techniques for both electron beam lithography (EBL) and in-situ one dimensional nano materials electrical characterization. A precise voltage contrast image positioning for in-situ EBL to integrate nanowires into suspended structures for nanoswitch fabrication has been developed. The in-situ EBL eliminates the stage movement error and field stitching error by preventing any movements of the stage during the nanolithography process; hence, a high precision laser stage and alignment marks on the substrate are not needed, which simplifies the traditional EBL process. The ZnO piezoelectronics is also studied using nano-manipulators in scanning electron microscope. Methods to improve the contact have been demonstrated and the contacts between probe tips and the nanowires are found to have significant impact on the measurement results.

Rights

The University of New Orleans and its agents retain the non-exclusive license to archive and make accessible this dissertation or thesis in whole or in part in all forms of media, now or hereafter known. The author retains all other ownership rights to the copyright of the thesis or dissertation.

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