Document Type

Article

Publication Date

10-1-1995

Abstract

A deformable three-reflection system that uses a bare silicon carbide substrate can function as an in-line, high-throughput (>30%), 90° phase shifter in the 50–100 nm spectral range. For a given extreme ultraviolet wavelength, an aluminum thin film can be deposited on the silicon carbide substrate to suppress the parallel (p) or perpendicular (s) polarization on single reflection or to introduce quarter-wave retardation and equal reflectances for incident p- and s-polarized light.

Journal Name

Applied Optics

Comments

This paper was published in Applied Optics and is made available as an electronic reprint with the permission of OSA. The paper can be found at the following URL on the OSA website: http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-34-28-6438. Systematic or multiple reproduction or distribution to multiple locations via electronic or other means is prohibited and is subject to penalties under law.

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