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The design steps for film—substrate single-reflection retarders are briefly stated and applied to the SiO2—Si film—substrate system at wavelength 6328 Å. The criterion of minimum-maximum error of the ellipsometric angle ψ is used to choose angle-of-incidence-tunable designs. Use is made of the (Φ-d) plane (angle of incidence versus thickness) to determine whether a given film—substrate system with known optical properties and film thickness can operate as a reflection retarder and to determine the associated angles of incidence and retardation angles. This leads to the concept of permissible-thickness bands and forbidden gaps for operation of a film—substrate system as a reflection retarder. Experimental measurements on one of the proposed designs proved the validity of the method.

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Journal of the Optical Society of America (1917-1983)


This paper was published in Journal of the Optical Society of America (1917-1983) and is made available as an electronic reprint with the permission of OSA. The paper can be found at the following URL on the OSA website: Systematic or multiple reproduction or distribution to multiple locations via electronic or other means is prohibited and is subject to penalties under law.