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A novel and very simple ellipsometer for the characterization of film-substrate systems that employs one rotating optical element (a polarizer) is proposed. The ellipsometer is based on detecting the angles of incidence at which a film-substrate system has equal amplitude attenuations for light polarized parallel (p) and perpendicular (s) to the plane of incidence. At a certain wavelength, the film thickness of the filmsubstrate system has to lie within permissible-thickness bands (PTB) for the technique to apply.

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Journal of the Optical Society of America (1917-1983)


This paper was published in Journal of the Optical Society of America (1917-1983)and is made available as an electronic reprint with the permission of OSA. The paper can be found at the following URL on the OSA website: Systematic or multiple reproduction or distribution to multiple locations via electronic or other means is prohibited and is subject to penalties under law.